South Korea develops next-generation nano-semiconductor image sensor

The Korea Institute of Science and Technology (KIST) recently announced a groundbreaking development in the field of optoelectronics, in collaboration with Yonsei University. The team has created a hybrid spatial double-layer structure that combines two-dimensional tungsten selenide (WSeâ‚‚) nano-single chips with one-dimensional zinc oxide (ZnO) nanowires. This innovative design enables the photodiode device to detect light across a wide spectrum, from ultraviolet to near-infrared wavelengths. The research was published in the prestigious international journal *Advanced Functional Materials*.

Low-dimensional semiconductor materials are considered essential for the next generation of electronic devices due to their unique physical properties and potential for high-performance applications. In this study, the researchers utilized two-dimensional WSeâ‚‚, which exhibits excellent light response and high hole mobility, making it an ideal P-type semiconductor. On the other hand, ZnO nanowires, known for their high electron mobility, serve as an effective N-type semiconductor. By combining these two structures, the team formed a mixed-dimensional PN junction, creating a novel photodiode device with enhanced performance.

The research team emphasized that this breakthrough not only demonstrates the feasibility of integrating 2D and 1D materials but also paves the way for advanced image sensor technologies. The developed photodiode is capable of capturing two-dimensional images with high sensitivity and broad spectral range, making it a promising candidate for future imaging systems. With further optimization, this technology could revolutionize areas such as optical sensing, medical imaging, and even space exploration.

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